High-NA EUV lithography optics becomes reality

Summary

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Authors: Lars Wischmeier, Paul Gräupner, Peter Kürz, Winfried Kaiser, Jan Van Schoot, Jörg Mallmann, Joost de Pee, Judon Stoeldraijer

Journal title: Extreme Ultraviolet (EUV) Lithography XI

Journal publisher: SPIE

Published year: 2020

Published pages: 4

DOI identifier: 10.1117/12.2543308

ISBN: 9781510634145