Mask defect detection with hybrid deep learning network

Summary

This is a publication. If there is no link to the publication on this page, you can try the pre-formated search via the search engines listed on this page.

Authors: Peter Evanschitzky, Nicole Auth, Tilmann Heil, Christian Felix Hermanns, Andreas Erdmann

Journal title: Journal of Micro/Nanopatterning, Materials, and Metrology

Journal publisher: S P I E - International Society for Optical Engineering

Published year: 2021

DOI identifier: 10.1117/1.jmm.20.4.041205

ISSN: 1932-5150