High-NA EUV lithography exposure tool: advantages and program progress

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Authors: Jan Van Schoot, Sjoerd Lok, Eelco van Setten, Ruben Maas, Kars Troost, Rudy Peeters, Jo Finders, Judon Stoeldraijer, Jos Benschop, Paul Graeupner, Peter Kuerz, Winfried Kaiser

Journal title: SPIE Photomask Technology + EUV Lithography

Journal number: Proceedings Volume 11517, Extreme Ultraviolet Lithography 2020

Journal publisher: SPIE

Published year: 2020

DOI identifier: 10.1117/12.2572932