High NA EUV optics: preparing lithography for the next big step

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Authors: Paul Graeupner, Peter Kuerz, Jan Van Schoot, Judon Stoeldraijer

Journal title: SPIE Photomask Technology + EUV Lithography

Journal number: Proceedings Volume 11854, International Conference on Extreme Ultraviolet Lithography 2021

Journal publisher: SPIE

Published year: 2021

DOI identifier: 10.1117/12.2600962