Solid Phase Recrystallization and Dopant Activation in Arsenic Ion-Implanted Silicon-On-Insulator by UV Laser Annealing


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Authors: Toshiyuki Tabata, Fabien Rozé, Pablo Acosta Alba, Sébastien Halty, Pierre-Edouard Raynal, Imen Karmous, Sébastien Kerdilès, Fulvio Mazzamuto

Journal title: The 20th International Workshop on Junction Technology (IWJT2021)

Journal number: 10-11 June 2021

Journal publisher: JSAP

Published year: 2021

Published pages: S4-1