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Authors: Mark van de Kerkhof, Hans Jasper, Leon Levasier, Rudy Peeters, Roderik van Es, Jan-Willem Bosker, Alexander Zdravkov, Egbert Lenderink, Fabrizio Evangelista, Par Broman, Bartosz Bilski, Thorsten Last
Journal title: Extreme Ultraviolet (EUV) Lithography VIII
Journal publisher: SPIE
Published year: 2017
Published pages: 101430D
DOI identifier: 10.1117/12.2258025
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