EUV lithography performance for manufacturing: status and outlook

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Authors: Alberto Pirati, Rudy Peeters, Daniel Smith, Sjoerd Lok, Martijn van Noordenburg, Roderik van Es, Eric Verhoeven, Henk Meijer, Arthur Minnaert, Jan-Willem van der Horst, Hans Meiling, Joerg Mallmann, Christian Wagner, Judon Stoeldraijer, Geert Fisser, Jo Finders, Carmen Zoldesi, Uwe Stamm, Herman Boom, David Brandt, Daniel Brown, Igor Fomenkov, Michael Purvis

Journal title: Extreme Ultraviolet (EUV) Lithography VII

Journal publisher: SPIE

Published year: 2016

Published pages: 97760A

DOI identifier: 10.1117/12.2220423