NXE pellicle: offering a EUV pellicle solution to the industry

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Authors: Derk Brouns, Aage Bendiksen, Par Broman, Eric Casimiri, Paul Colsters, Peter Delmastro, Dennis de Graaf, Paul Janssen, Mark van de Kerkhof, Ronald Kramer, Matthias Kruizinga, Henk Kuntzel, Frits van der Meulen, David Ockwell, Maria Peter, Daniel Smith, Beatrijs Verbrugge, David van de Weg, Jim Wiley, Noelie Wojewoda, Carmen Zoldesi, Pieter van Zwol

Journal title: Extreme Ultraviolet (EUV) Lithography VII

Journal publisher: SPIE

Published year: 2016

Published pages: 97761Y

DOI identifier: 10.1117/12.2221909