Contrast optimization for 0.33NA EUV lithography

Summary

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Authors: Jo Finders, Sander Wuister, Thorsten Last, Gijsbert Rispens, Eleni Psari, Jan Lubkoll, Eelco van Setten, Friso Wittebrood

Journal title: Extreme Ultraviolet (EUV) Lithography VII

Journal publisher: SPIE

Published year: 2016

Published pages: 97761P

DOI identifier: 10.1117/12.2220036