EUV High-NA scanner and mask optimization for sub 8 nm resolution

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Authors: Jan van Schoot, Koen van Ingen Schenau, Gerardo Bottiglieri, Kars Troost, John Zimmerman, Sascha Migura, Bernhard Kneer, Jens Timo Neumann, Winfried Kaiser

Journal title: Photomask Technology 2015

Journal publisher: SPIE

Published year: 2015

Published pages: 963503

DOI identifier: 10.1117/12.2202258