First light at EBL2

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Authors: Norbert Koster, Edwin te Sligte, Freek Molkenboer, Alex Deutz, Peter van der Walle, Pim Muilwijk, Wouter Mulckhuyse, Bastiaan Oostdijck, Christiaan Hollemans, Björn Nijland, Peter Kerkhof, Michel van Putten, Jeroen Westerhout

Journal title: Extreme Ultraviolet (EUV) Lithography VIII

Journal publisher: SPIE

Published year: 2017

Published pages: 101431N

DOI identifier: 10.1117/12.2257997