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Authors: Norbert Koster, Edwin te Sligte, Alex Deutz, Freek Molkenboer, Pim Muilwijk, Peter van der Walle, Wouter Mulckhuyse, Bjorn Nijland, Peter Kerkhof, Michel van Putten
Journal title: Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
Journal publisher: SPIE
Published year: 2017
Published pages: 104540O
DOI identifier: 10.1117/12.2279025
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