Optimized phase-shifting masks for high-resolution resist patterning by interference lithography

This is a publication. If there is no link to the publication on this page, you can try the pre-formated search via the search engines listed on this page.

Authors: Sascha Brose, Serhiy Danylyuk, Lukas Bahrenberg, Peter Loosen, Larissa Juschkin, Rainer Lebert

Journal title: International Conference on Extreme Ultraviolet Lithography 2017

Journal publisher: SPIE

Published year: 2017

Published pages: 81

DOI identifier: 10.1117/12.2280582

ISBN: 9781-510613751