Analysis of distinct scattering of extreme ultraviolet phase and amplitude multilayer defects with an actinic dark-field microscope

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Authors: Lukas Bahrenberg, Stefan Herbert, Jenny Tempeler, Aleksey Maryasov, Oskar Hofmann, Serhiy Danylyuk, Rainer Lebert, Peter Loosen, Larissa Juschkin

Journal title: Extreme Ultraviolet (EUV) Lithography VI

Journal publisher: SPIE

Published year: 2015

Published pages: 942229

DOI identifier: 10.1117/12.2085929