Advanced EUV mask and imaging modeling

Summary

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Authors: Peter Evanschitzky, Andreas Erdmann

Journal title: Journal of Micro/Nanolithography, MEMS, and MOEMS

Journal number: 16/04

Journal publisher: S P I E - International Society for Optical Engineering

Published year: 2017

Published pages: 1

DOI identifier: 10.1117/1.jmm.16.4.041005

ISSN: 1932-5150