Attenuated PSM for EUV: Can they mitigate 3D mask effects?

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Authors: Andreas Erdmann, Peter Evanschitzky, Vicky Philipsen, Markus Bauer, Eric Hendrickx, Hazem Mesilhy

Journal title: Extreme Ultraviolet (EUV) Lithography IX

Journal publisher: SPIE

Published year: 2018

Published pages: 35

DOI identifier: 10.1117/12.2299648

ISBN: 9781-510616592