Characterization and mitigation of 3D mask effects in extreme ultraviolet lithography

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Authors: Andreas Erdmann, Dongbo Xu, Peter Evanschitzky, Vicky Philipsen, Vu Luong, Eric Hendrickx

Journal title: Advanced Optical Technologies

Journal number: 6/3-4

Journal publisher: De Gruyter

Published year: 2017

DOI identifier: 10.1515/aot-2017-0019

ISSN: 2192-8584