Innovative scatterometry approach for self-aligned quadruple patterning (SAQP) process control

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Authors: Anil Gunay Demirkol, Efrain Altamirano-Sánchez, IMEC (Belgium); Stephane Heraud, Nova Measuring Instruments GmbH (Germany); Stephane Godny, Anne-Laure Charley, Philippe Leray, IMEC (Belgium); Ronen Urenski, Oded Cohen, Igor Turovets, Shay Wolfling, Nova Measuring Instruments Ltd. (Israel)

Journal title: SPIE Advanced Lithography 2016

Journal number: 2016

Journal publisher: SPIE

Published year: 2016

Published pages: 60,61