EBL2, a flexible, controlled EUV exposure and surface analysis facility

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Authors: Edwin te Sligte, Norbert Koster, Freek Molkenboer, Alex Deutz

Journal title: Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology

Journal publisher: SPIE

Published year: 2016

Published pages: 99840R

DOI identifier: 10.1117/12.2240302