Introducing the EUV CNT pellicle

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Authors: Jae Uk Lee, Johannes Vanpaemel, Ivan Pollentier, Christoph Adelmann, Houman Zahedmanesh, Cedric Huyghebaert, Marina Timmermans, Michael De Volder, Emily Gallagher

Journal title: Photomask Technology 2016

Journal number: 99850C (25 October 2016)

Journal publisher: SPIE

Published year: 2016

Published pages: 99850C

DOI identifier: 10.1117/12.2243019