Novel membrane solutions for the EUV pellicle: better or not?

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Authors: Ivan Pollentier, Jae Uk Lee, Marina Timmermans, Christoph Adelmann, Houman Zahedmanesh, Cedric Huyghebaert, Emily E. Gallagher

Journal title: Extreme Ultraviolet (EUV) Lithography VIII

Journal number: 01430L (24 March 2017)

Journal publisher: SPIE

Published year: 2017

Published pages: 101430L

DOI identifier: 10.1117/12.2257891