Reducing EUV mask 3D effects by alternative metal absorbers

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Authors: Vicky Philipsen, Kim Vu Luong, Laurent Souriau, Eric Hendrickx, Andreas Erdmann, Dongbo Xu, Peter Evanschitzky, Robbert W. E. van de Kruijs, Arash Edrisi, Frank Scholze, Christian Laubis, Mathias Irmscher, Sandra Naasz, Christian Reuter

Journal title: Extreme Ultraviolet (EUV) Lithography VIII

Journal publisher: SPIE

Published year: 2017

Published pages: 1014310

DOI identifier: 10.1117/12.2257929