Mitigating EUV mask 3D effects by alternative metal absorbers

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Authors: Philipsen, V.; Luong, V.; Hendrickx, E.; Erdmann, A.; Dongbo, X.; Evanschitzky, P.; van de Kruijs, R.; Edrisi, A.; Scholze, F.; Laubis, C.; Irmscher, M. and Naasz, S.

Journal publisher: International Symposium on Extreme Ultraviolet Lithography

Published year: 2016