Optimized EUV mask absorber stack for improved imaging by reducing roughness and crystallinity of alternative absorber materials

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Authors: Luong, V.; Philipsen, V.; Hendrickx, E.; Scholze, F.; van de Kruijs, R.; Edrisi, A.; Wood, O. and Heyns, M.

Journal publisher: International Symposium on Extreme Ultraviolet Lithography

Published year: 2016