Layout optimization and trade-off between 193i and EUV-based patterning for SRAM cells to improve performance and process variability at 7nm technology node

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Authors: Sushil Sakhare, Darko Trivkovic, Tom Mountsier, Min-Soo Kim, Dan Mocuta, Julien Ryckaert, Abdelkarim Mercha, Diederik Verkest, Aaron Thean, Mircea Dusa

Journal title: Design-Process-Technology Co-optimization for Manufacturability IX

Journal publisher: SPIE

Published year: 2015

Published pages: 94270O

DOI identifier: 10.1117/12.2086100