Self-aligned-quadruple-patterning for N7/N5 silicon fins

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Authors: Efrain Altamirano-Sánchez, Tao S. Zheng, Anil Gunay Demirkol, Gian F. Lorusso, Toby Hopf, Jean-Christophe Everat IMEC (Belgium), William Clark, Coventor (France); Daniel Sobieski, Fung-Suong Ou, Lam Research Corp. (United States); David Hellin, Lam Research (Belgium)

Journal title: SPIE Advanced Lithigraphy 2016

Journal publisher: SPIE

Published year: 2016