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Authors: Ivan Pollentier, Johannes Vanpaemel, Jae Uk Lee, Christoph Adelmann, Houman Zahedmanesh, Cedric Huyghebaert, Emily E. Gallagher
Journal title: Extreme Ultraviolet (EUV) Lithography VII
Journal publisher: SPIE
Published year: 2016
Published pages: 977620
DOI identifier: 10.1117/12.2220031
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