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Authors: Christian Laubis, Annett Barboutis, Christian Buchholz, Andreas Fischer, Anton Haase, Florian Knorr, Heiko Mentzel, Jana Puls, Anja Schönstedt, Michael Sintschuk, Victor Soltwisch, Christian Stadelhoff, Frank Scholze
Journal title: Extreme Ultraviolet (EUV) Lithography VII
Journal publisher: SPIE
Published year: 2016
Published pages: 977627
DOI identifier: 10.1117/12.2218902
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