Characterization of Mo/Si mirror interface roughness for different Mo layer thickness using resonant diffuse EUV scattering

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Authors: Anton Haase, Victor Soltwisch, Frank Scholze, Stefan Braun

Journal title: Optical Systems Design 2015: Optical Fabrication, Testing, and Metrology V

Journal publisher: SPIE

Published year: 2015

Published pages: 962804

DOI identifier: 10.1117/12.2191265