High-Resistivity Substrates with PN Interface Passivation in 22 nm FD-SOI

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Authors: M. Rack et al.

Journal publisher: 2022 International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA), 2022, pp. 1-2,

Published year: 2022

DOI identifier: 10.1109/vlsi-tsa54299.2022.9771028