Effect of Al2O3 interlayers on the microstructure and electrical response of ferroelectric doped HfO 2 thin films

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Authors: Maximilian Lederer, Konrad Seidel, Ricardo Olivo, Thomas Kämpfe, Lukas M. Eng

Journal title: Frontiers in Nanotechnology

Journal number: 00000000

Journal publisher: Frontiers

Published year: 2022

DOI identifier: 10.3389/fnano.2022.900379

ISSN: 0000-0000