A Benchmark Study of Complementary-Field Effect Transistor (CFET) Process Integration Options Done by Virtual Fabrication

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Authors: B. Vincent, J. Boemmels, J. Ryckaert and J. Ervin

Journal title: IEEE Journal of the Electron Devices Society

Journal publisher: Institute of Electrical and Electronics Engineers Inc.

Published year: 2020

DOI identifier: 10.1109/jeds.2020.2990718

ISSN: 2168-6734