Mask absorber development to enable next-generation EUVL

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Authors: Philipsen, V., Luong, K.V., Opsomer, K., Souriau, L., Rip, J., Detavernier, C., Erdmann, A., Evanschitzky, P., Laubis, C., Hönicke, Ph., Soltwisch, V., Hendrickx, E.

Journal title: SPIE DIGITAL LIBRARY

Journal publisher: SPIE

Published year: 2019