Epitaxial growth by MOCVD on 200 mm engineered substrates for power devices & ICs beyond 650 V

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Authors: Fahle, Dirk; Zhao, Ming; Geens, Karen; Li, Xiangdong; Wellekens, Dirk; Magnani, Alessandro; Amirifar, Nooshin; Bakeroot, Benoit; You, Shuzhen; Odnoblyudov, Vladimir; Aktas, Ozgur; Basceri, Cem; Marcon, Denis; Groeseneken, Guido; Decoutere, Stefaan; Hahn, Herwig; Heuken,

Journal title: DGKK Workshop Epitaxy of III-V Semiconductors

Journal publisher: DGKK

Published year: 2022