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Authors: Yoann Blancquaert, Nivea Figueiro, Thibault Labbaye, Francisco Sanchez, Stephane Heraud, Roy Koret, Matthew Sendelbach, Ralf Michel, Shay Wolfling, Stephane Rey, Laurent Pain
Journal title: Metrology, Inspection, and Process Control for Microlithography XXXI
Journal publisher: SPIE
Published year: 2017
Published pages: 101451F
DOI identifier: 10.1117/12.2261389
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