Localized STRASS Technique on Advanced FDSOI Platform: Highly Tensile Si Demonstration for Dual Strain CMOS Integration

This is a publication. If there is no link to the publication on this page, you can try the pre-formated search via the search engines listed on this page.

Authors: A. Bonnevialle, S. Reboh, C. Le Royer, Y. Morand, J.-M. Hartmann, D. Rouchon, J.-M. Pedini, C. Tabone, N. Rambal, A. Payet, C. Plantier, F. Boeuf, M. Haond, A. Claverie, M. Vinet

Journal publisher: E-MRS 2016 (European Material Research Society)

Published year: 2016