(Invited) Low-Temperature Microwave-Based Plasma Oxidation of Ge and Oxidation of Silicon Followed by Plasma Nitridation

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Authors: W. Lerch, T. Schick, N. Sacher, W. Kegel, J. Niess, M. Czernohorsky, S. Riedel

Journal title: ECS Transactions

Journal number: 72/4

Journal publisher: Electrochemical Society, Inc.

Published year: 2016

Published pages: 101-114

DOI identifier: 10.1149/07204.0101ecst

ISSN: 1938-5862