Catalytic ALD of SiO2 as spacer for an E-Beam direct write self-aligned double patterning process on 300 mm wafers

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Authors: K. Kühnel, S. Riedel, W. Weinreich, X. Thrun, M. Czernohorsky, B. Pätzold, M. Rudolph

Journal publisher: 16th International Conference on Atomic Layer Deposition

Published year: 2016