Attenuated phase shift mask for extreme ultraviolet: can they mitigate three-dimensional mask effects?

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Authors: A. Erdmann, P. Evanschitzky, H. Mezilhy, V. Philipsen, E. Hendrickx, M. Bauer

Journal title: Journal of Micro/Nanolithography, MEMS, and MOEMS

Journal number: 18/01

Journal publisher: S P I E - International Society for Optical Engineering

Published year: 2019

Published pages: 1

DOI identifier: 10.1117/1.jmm.18.1.011005

ISSN: 1932-5150