EUV for HVM: towards an industrialized scanner for HVM NXE3400B performance update

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Authors: Mark A. van de Kerkhof, Arthur W. E. Minnaert, Marco Pieters, Hans Meiling, Joost Smits, Rudy Peeters, Roderik van Es, Geert Fisser, Jos W. de Klerk, Roel Moors, Eric Verhoeven, Leon Levasier

Journal title: Extreme Ultraviolet (EUV) Lithography IX

Journal number: 2018

Journal publisher: SPIE

Published year: 2018

Published pages: 13

DOI identifier: 10.1117/12.2299503

ISBN: 9781-510616592