The future of EUV lithography: continuing Moore's Law into the next decade

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Authors: Jan van Schoot, Kars Troost, Frank Bornebroek, Rob van Ballegoij, Sjoerd Lok, Peter Krabbendam, Judon Stoeldraijer, Jos Benschop, Jo Finders, Hans Meiling, Eelco van Setten, Bernhard Kneer, Peter Kuerz, Winfried Kaiser, Tilmann Heil, Sascha Migura

Journal title: Extreme Ultraviolet (EUV) Lithography IX

Journal number: 2018

Journal publisher: SPIE

Published year: 2018

Published pages: 23

DOI identifier: 10.1117/12.2295800

ISBN: 9781-510616592