High NA EUV lithography: Next step in EUV imaging

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Authors: Eelco van Setten, Gerardo Bottiglieri, John McNamara, Jan van Schoot, Kars Troost, Joseph Zekry, Timon Fliervoet, Stephen Hsu, Joerg Zimmermann, Matthias Roesch, Bartosz Bilski, Paul Graeupner

Journal title: Extreme Ultraviolet (EUV) Lithography X

Journal number: 2019

Journal publisher: SPIE

Published year: 2019

Published pages: 5

DOI identifier: 10.1117/12.2514952

ISBN: 9781-510625624