Reduction in overlay error from mark asymmetry using simulation and alignment models

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Authors: Boris Menchtchikov, Robert Socha, Chumeng Zheng, Sudharshanan Raghunathan, Leendertjan Karssemeijer, Irina Lyulina, Jonathan Lee, Igor Aarts, Krishanu Shome, Chris de Ruiter, Manouk Rijpstra, Henry Megens, Ralph Brinkhof, Floris Teeuwisse, Chung-Tien Li, Jan Hermans, Philippe Leray

Journal title: Optical Microlithography XXXI

Journal number: 2018

Journal publisher: SPIE

Published year: 2018

Published pages: 11

DOI identifier: 10.1117/12.2297493

ISBN: 9781-510616677