Cross-platform (NXE-NXT) machine-to-machine overlay matching supporting next node chip manufacturing

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Authors: Ting-Ju Yueh, Miao-Chi Chen, Hsueh-Hung Wu, Shin-Rung Peng, Chun-Kuang Chen, L. J. Chen, John Lin, Kevin Cheng, Alexander Padi, Cathy Wang, Jean Phillippe van Damme, Theo Thijssen, Marcel Beckers, Albert Mollema, Leon Levasier, Jason Hung, Amy Chen, Floris Teeuwisse, Robin Tijssen, Marcel Mastenbroek, Harald Vos, Wilson Tzeng, Laurens van Bokhoven, Niels Lammers

Journal title: Optical Microlithography XXXI

Journal number: 2018

Journal publisher: SPIE

Published year: 2018

Published pages: 8

DOI identifier: 10.1117/12.2297387

ISBN: 9781-510616677