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Authors: Henry Megens, Ralph Brinkhof, Igor Aarts, Haico Kok, Leendertjan Karssemeijer, Gijs ten Haaf, Shawn Lee, Daan Slotboom, Chris de Ruiter, Irina Lyulina, Simon Huisman, Stefan Keij, Evert Mos, Wim Tel, Manouk Rijpstra, Emil Schmitt-Weaver, Kaustuve Bhattacharyya, Robert Socha, Boris Menchtchikov, Michael Kubis, Jan Mulkens
Journal title: Optical Microlithography XXXII
Journal number: 2019
Journal publisher: SPIE
Published year: 2019
Published pages: 18
DOI identifier: 10.1117/12.2515449
ISBN: 9781-510625709