High-NA EUV imaging: challenges and outlook

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Authors: Bartosz Bilski, Joerg Zimmermann, Matthias Roesch, Jack Liddle, Eelco van Setten, Gerardo Bottiglieri, Jan van Schoot

Journal title: 35th European Mask and Lithography Conference (EMLC 2019)

Journal number: 2019

Journal publisher: SPIE

Published year: 2019

Published pages: 42

DOI identifier: 10.1117/12.2536329

ISBN: 9781-510630680