High-NA EUV Lithography exposure tool: program progress and mask impact (Conference Presentation)

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Authors: Jan Van Schoot, Eelco van Setten, Kars Troost, Sjoerd Lok, Judon Stoeldraijer, Rudy Peeters, Jos Benschop, Joerg Zimmermann, Paul Graeupner, Peter Kuerz, Winfried Kaiser

Journal title: International Conference on Extreme Ultraviolet Lithography 2019

Journal number: 2019

Journal publisher: SPIE

Published year: 2019

Published pages: 34

DOI identifier: 10.1117/12.2538325

ISBN: 9781-510629981