High-NA EUV lithography: pushing the limits

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Authors: Claus Zahlten, P. Gräupner, Jan van Schoot, Peter Kuerz, J. Stoeldraijer, Winfried Kaiser

Journal title: 35th European Mask and Lithography Conference (EMLC 2019)

Journal number: 2019

Journal publisher: SPIE

Published year: 2019

Published pages: 43

DOI identifier: 10.1117/12.2536469

ISBN: 9781-510630680