Inspection of stochastic defects with broadband plasma optical systems for extreme ultraviolet (EUV) lithography

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Authors: Kaushik Sah, Sandip Halder, Andrew Cross, Philippe Leray

Journal title: IEEE Transactions on Semiconductor Manufacturing

Journal publisher: Institute of Electrical and Electronics Engineers

Published year: 2020

Published pages: 1-1

DOI identifier: 10.1109/tsm.2019.2963483

ISSN: 0894-6507