Process window discovery methodology for extreme ultraviolet (EUV) lithography

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Authors: Sandip Halder, Dieter Van den Heuvel, Stephane Lariviere, Philippe Leray, Kaushik Sah, Andrew Cross, Antonio Mani

Journal title: Metrology, Inspection, and Process Control for Microlithography XXXIII

Journal number: 2019

Journal publisher: SPIE

Published year: 2019

Published pages: 65

DOI identifier: 10.1117/12.2515805

ISBN: 9781-510625662